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dc.contributor.authorCassé, Mikaël
dc.contributor.authorGhibaudo, Gérard
dc.date.accessioned2025-03-08T07:24:47Z
dc.date.available2025-03-08T07:24:47Z
dc.date.issued2022
dc.date.submitted2024-05-23T10:13:38Z
dc.identifierONIX_20240523__66
dc.identifierhttps://library.oapen.org/handle/20.500.12657/90546
dc.identifier.urihttps://doab-dev.siscern.org/handle/20.500.12854/187092
dc.description.abstractundefined
dc.languageEnglish
dc.rightsopen access
dc.subject.otherEngineering thermodynamics
dc.subject.otherthema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TG Mechanical engineering and materials::TGM Materials science::TGMB Engineering thermodynamics
dc.titleChapter Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications
dc.typechapter
oapen.identifier.doi10.5772/intechopen.98403
oapen.relation.isPublishedBy035ecc65-6737-43cf-a13a-6bdf67ce01f4
oapen.relation.isFundedBy3f0a4da2-418f-411a-ae5f-8d27e0601aec
oapen.relation.isFundedBy178e65b9-dd53-4922-b85c-0aaa74fce079
oapen.collectionEuropean Research Council (ERC)
oapen.grant.number871764
dc.relationisFundedBy178e65b9-dd53-4922-b85c-0aaa74fce079


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