High Cycle Fatigue of Al and Cu Thin Films by a Novel High-Throughput Method
Abstract
In the last two decades, the reliability of small electronic devices used in automotive or consumer electronics gained researchers attention. Thus, there is the need to understand the fatigue properties and damage mechanisms of thin films. In this thesis a novel high-throughput testing method for thin films on Si substrate is presented. The specialty of this method is to test one sample at different strain amplitudes at the same time and measure an entire lifetime curve with only one experiment.
Keywords
damage structure; Fatigue; thin film; cantilever bendingISBN
9783731500254Publisher
KIT Scientific PublishingPublisher website
http://www.ksp.kit.edu/Publication date and place
2013Series
Schriftenreihe des Instituts für Angewandte Materialien, Karlsruher Institut für Technologie,Classification
Technology: general issues


