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dc.contributor.authorKelsall, Robert W.*
dc.date.accessioned2021-02-12T03:35:52Z
dc.date.available2021-02-12T03:35:52Z
dc.date.issued2019*
dc.date.submitted2019-06-26 08:44:06*
dc.identifier33687*
dc.identifier.urihttps://directory.doabooks.org/handle/20.500.12854/59377
dc.description.abstractSilicon has been proven to be remarkably resilient as a commercial electronic material. The microelectronics industry has harnessed nanotechnology to continually push the performance limits of silicon devices and integrated circuits. Rather than shrinking its market share, silicon is displacing “competitor” semiconductors in domains such as high-frequency electronics and integrated photonics. There are strong business drivers underlying these trends; however, an important contribution is also being made by research groups worldwide, who are developing new configurations, designs, and applications of silicon-based nanoscale and nanostructured materials. This Special Issue features a selection of papers which illustrate recent advances in the preparation of chemically or physically engineered silicon-based nanostructures and their application in electronic, photonic, and mechanical systems.*
dc.languageEnglish*
dc.subjectTA1-2040*
dc.subjectT1-995*
dc.subject.classificationthema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues::TBX History of engineering and technologyen_US
dc.subject.otherohmic contact*
dc.subject.othergraphene oxide*
dc.subject.otheroptical gain media*
dc.subject.othernano silica sol*
dc.subject.otherin-situ growth*
dc.subject.othersilicon quantum dots*
dc.subject.othergold nanoparticles*
dc.subject.othernanofabrication*
dc.subject.otherthermal reduction*
dc.subject.otherlong-term mechanical tests*
dc.subject.otherself-aligned nanowires*
dc.subject.othersilicon carbide*
dc.subject.othermicro-mechanism*
dc.subject.othertelecom wavelengths*
dc.subject.othernanoparticles*
dc.subject.othersingle-crystal Si nanomembrane (Si NMs)*
dc.subject.othernanowires*
dc.subject.otherlocalized surface plasmon resonances*
dc.subject.otherC/C composites*
dc.subject.otherthin film transistor*
dc.subject.otherstrain engineering*
dc.subject.othernanomembranes*
dc.subject.otherlight emitting devices*
dc.subject.otherquantum photonics*
dc.subject.otherultrathin nanowires*
dc.subject.otherelectroluminescence enhancement*
dc.subject.othermechanical properties*
dc.subject.othergroup-IV semiconductors*
dc.subject.otherself-assembly*
dc.subject.othersilicon*
dc.subject.otherSiC nanowires*
dc.subject.otherfluctuating temperature-humidity conditions*
dc.subject.otherTiO2 insertion layer*
dc.titleSilicon-Based Nanomaterials: Technology and Applications*
dc.typebook
oapen.identifier.doi10.3390/books978-3-03921-043-5*
oapen.relation.isPublishedBy46cabcaa-dd94-4bfe-87b4-55023c1b36d0*
oapen.relation.isbn9783039210428*
oapen.relation.isbn9783039210435*
oapen.pages94*
oapen.edition1st*


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